Return to search results
AM Bench 2025 Vat Photopolymerization Challenge 09
This Photopolymer AM Bench-2025 Challenge is to predict the cure depth versus radiant exposure (often called dose) of prototypical resins with varying monomer functionality and photoabsorber type, for irradiation with narrow-bandwidth (< 5 nm) 385 nm or broad-bandwidth (> 10 nm) 405 nm ot 385 nm light. Fluorescing and non-fluorescing absorbers will be considered. Specimens will be large enough such that size-dependent effects are negligible. Modelers will be provided with reactivity and thermophysical property data for the resins as well as radiometric data for the light sources. Modelers will predict the detailed working curve(s) as well as extracted critical energy Ec and depth of light penetration Dp for 8 conditions (2 monomers, 2 photoabsorbers, 2 light sources). The primary objective is to determine if and how the presence of a fluorescing and non-fluorescing absorber affect cure depth. Ultimately, the improved understanding and prediction of these relations will enable more repeatable part fabrication.
Experimental data for model calibration and challenge comparison is provided through resin characterization (e.g. real-time Fourier transform infrared spectroscopy and ultraviolet-visible spectroscopy) and system calibration (e.g., radiometry and spectroscopy). These experiments were carried out at the National Institute of Standards and Technology and the University of Colorado. Released calibration measurements were performed on four, open-source resins to serve as representative examples for resins in the field. Calibration data are available for download here.
https://www.nist.gov/ambench/am-bench-2025-measurements-and-challenge-problems
Resources
3 resources available
-
Resource 1
ZIP -
Resource 2
TXT -
3759_README
TXT
Find Related Datasets
Search by Tags
Click any tag below to search for similar datasets
Complete Metadata
| @type | dcat:Dataset |
|---|---|
| accessLevel | public |
| accrualPeriodicity | irregular |
| bureauCode |
[ "006:55" ] |
| contactPoint |
{ "fn": "Callie Higgins", "hasEmail": "mailto:callie.higgins@nist.gov" } |
| description | This Photopolymer AM Bench-2025 Challenge is to predict the cure depth versus radiant exposure (often called dose) of prototypical resins with varying monomer functionality and photoabsorber type, for irradiation with narrow-bandwidth (< 5 nm) 385 nm or broad-bandwidth (> 10 nm) 405 nm ot 385 nm light. Fluorescing and non-fluorescing absorbers will be considered. Specimens will be large enough such that size-dependent effects are negligible. Modelers will be provided with reactivity and thermophysical property data for the resins as well as radiometric data for the light sources. Modelers will predict the detailed working curve(s) as well as extracted critical energy Ec and depth of light penetration Dp for 8 conditions (2 monomers, 2 photoabsorbers, 2 light sources). The primary objective is to determine if and how the presence of a fluorescing and non-fluorescing absorber affect cure depth. Ultimately, the improved understanding and prediction of these relations will enable more repeatable part fabrication. Experimental data for model calibration and challenge comparison is provided through resin characterization (e.g. real-time Fourier transform infrared spectroscopy and ultraviolet-visible spectroscopy) and system calibration (e.g., radiometry and spectroscopy). These experiments were carried out at the National Institute of Standards and Technology and the University of Colorado. Released calibration measurements were performed on four, open-source resins to serve as representative examples for resins in the field. Calibration data are available for download here. https://www.nist.gov/ambench/am-bench-2025-measurements-and-challenge-problems |
| distribution |
[ { "mediaType": "application/zip", "downloadURL": "https://data.nist.gov/od/ds/ark:/88434/mds2-3759/AMBench2025-09_Challenge.zip" }, { "mediaType": "text/plain", "downloadURL": "https://data.nist.gov/od/ds/ark:/88434/mds2-3759/AMBench2025-09_Challenge.zip.sha256" }, { "title": "3759_README", "mediaType": "text/plain", "downloadURL": "https://data.nist.gov/od/ds/mds2-3759/3759_README.txt" } ] |
| identifier | ark:/88434/mds2-3759 |
| issued | 2025-12-03 |
| keyword |
[ "3D printing", "AM Bench", "additive manufacturing", "cure depth", "modeling", "vat photopolymerization" ] |
| landingPage | https://data.nist.gov/od/id/mds2-3759 |
| language |
[ "en" ] |
| license | https://www.nist.gov/open/license |
| modified | 2025-03-11 00:00:00 |
| programCode |
[ "006:045" ] |
| publisher |
{ "name": "National Institute of Standards and Technology", "@type": "org:Organization" } |
| theme |
[ "Manufacturing:Additive manufacturing", "Manufacturing:Manufacturing systems design and analysis", "Materials:Materials characterization", "Materials:Modeling and computational material science", "Materials:Polymers", "Metrology:Dimensional metrology", "Metrology:Optical, photometry, and laser metrology" ] |
| title | AM Bench 2025 Vat Photopolymerization Challenge 09 |
