X-ray Metrology for the Semiconductor Industry Tutorial
Access & Use Information
Downloads & Resources
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DOI Access to X-ray Metrology for the...HTML
DOI Access to X-ray Metrology for the Semiconductor Industry Tutorial
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Landing PageLanding Page
Dates
Metadata Created Date | March 11, 2021 |
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Metadata Updated Date | July 29, 2022 |
Metadata Source
- Data.json Data.json Metadata
Harvested from NIST
Additional Metadata
Resource Type | Dataset |
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Metadata Created Date | March 11, 2021 |
Metadata Updated Date | July 29, 2022 |
Publisher | National Institute of Standards and Technology |
Maintainer | |
Identifier | 7CE906EBFAD7231EE0532457068153892009 |
Language | en |
Data Last Modified | 2018-12-01 |
Category | Nanotechnology:Nanoelectronics, Metrology:Dimensional metrology, Electronics:Semiconductors, Nanotechnology:Nanometrology |
Public Access Level | public |
Bureau Code | 006:55 |
Metadata Context | https://project-open-data.cio.gov/v1.1/schema/data.json |
Schema Version | https://project-open-data.cio.gov/v1.1/schema |
Catalog Describedby | https://project-open-data.cio.gov/v1.1/schema/catalog.json |
Harvest Object Id | 61c2392a-339b-47ce-ab50-85a39277abe1 |
Harvest Source Id | 74e175d9-66b3-4323-ac98-e2a90eeb93c0 |
Harvest Source Title | NIST |
Homepage URL | https://www.nist.gov/mml/materials-science-and-engineering-division/polymers-processing-group/x-ray-metrology |
License | https://www.nist.gov/open/license |
Program Code | 006:045 |
Source Datajson Identifier | True |
Source Hash | 630cf6a7febe4f019d4d335d2b7dfc9163915b45 |
Source Schema Version | 1.1 |
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