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Geodatabase and raster datasets for the potentiometric-surface maps and depth-to-water surface of the Tokio aquifer, in Arkansas, 2017

Published by U.S. Geological Survey | Department of the Interior | Catalog Last Checked: September 10, 2026 at 09:17 PM | Dataset Last Updated: July 20, 2026 at 12:00 AM
This dataset includes a geodatabase used to construct the 2017 potentiometric‑surface maps and depth-to-water surface rasters of the Tokio aquifer. The datasets include: (1) groundwater‑level measurements and groundwater-altitude (GWA) from wells measured in 2017; (2) surface‑water‑altitude (SWA) values derived from a streamgage located within the Tokio aquifer outcrop area; (3) interpreted potentiometric‑surface contours, in feet; (4) potentiometric‑surface rasters, in feet; (5) potentiometric‑surface rasters, in meters; and (6) a depth‑to‑water raster, in feet. Potentiometric‑surface conditions are ideally represented using groundwater‑level measurements collected within a short time interval. Most groundwater‑level measurements in 2017 were collected between March 30 to August 3, 2017, from 24 wells due to scheduling and logistical constraints. As a result, only 21 wells with groundwater‑level measurements collected between June 29 and August 3, 2017, were used in the 2017 potentiometric‑surface map of the Tokio aquifer. Wells used or evaluated for inclusion in the potentiometric‑surface mapping are identified in the fields USE_2017 and USECMT2017. In addition to GWA, SWA values from streamgages that were active in 2017 and located within the Tokio outcrop region were included in the 2017 potentiometric‑surface map of the Tokio aquifer. All GWA and SWA values are referenced to the North American Vertical Datum of 1988 (NAVD 88). The resulting potentiometric-surface contours and rasters depict generalized groundwater conditions within portions of the Tokio aquifer where data coverage allowed reliable interpretation, therefore these data may not be suitable for certain purposes such as groundwater-flow models or fine‑scale applications.

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