Patent AT-E399811-T1: [Translated] PHOTOCHEMICALLY AND/OR THERMALLY STRUCTURABLE SILANE-BASED RESINS AND A ONE-STEP PROCESS FOR THE PRODUCTION THEREOF

Photochemically- and/or thermally-structurable silane resins are obtained by condensation of a mixture of: (a) alkylsilanes with polymerizable organic group(s) and leaving group(s); and (b) silanediols with alkyl groups and/or polymerizable groups other than those containing aryl residues. Photochemically- and/or thermally-structurable silane resins (SR) are obtained by at least partial condensation of a mixture containing: (a) silane compound(s) of formula (I); and (b) silanediol(s) of formula (II). [Image] R : a group which undergoes photochemically- and/or thermally-induced radical or cationic polymerization of an organic residue; R 2>optionally substituted, linear, branched or cyclic 1-12C alkyl; X : a leaving group; a : 1 or 2; b : 0 or 1; (a+b) : not more than 2; and R 1>as for R 2>, or a polymerizable group (as defined for R) other than a group containing an aryl residue. Independent claims are also included for (1) a method for the production of (SR) by condensation of a mixture of (I) and (II) in the presence of an essentially anhydrous solvent or suspension agent; (2) at least partly condensed and polymerized hybrid polymers obtained from SR; (3) a method for the production of (II) by controlled hydrolysis of the corresponding di-(1-6C alkoxy)-silanes, especially the dimethoxy, diethoxy, di-(n- or iso-propoxy) or di-isobutoxy compounds; (4) a method for the production of (II) by controlled hydrolysis of the corresponding difluoro-, dichloro- or dibromo-silanes in the presence of a stoichiometric amount of trialkylamine; (5) silanediols (II) with defined values of R 2>.

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