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NIST Database of the Thermophysical Properties of Gases Used in the Semiconductor Industry

Metadata Updated: July 9, 2025

The 1999 Semiconductor Industry Association (SIA) International Technology Roadmap for Semiconductors (ITRS) identifies 'Equipment Modeling' as first in a list of 'Technology Requirements' and states that 'the drivers for equipment modeling are equipment design, process control, . . . ' The ITRS indicates that continuing research is needed to obtain experimental data for 'transport and thermal constants.' This Project will generate transport and thermodynamic property data for the gases used in semiconductor processing. The data will be useful for equipment modeling in chemical vapor deposition (CVD) processes and the data will also provide a rational basis for the calibration of mass flow controllers (MFCs) used to meter process gases. NIST is measuring the thermophysical properties of the process gases, the 'surrogate' gases, and binary mixtures of process and carrier gases. The process gases are used in CVD and the surrogate gases are used to calibrate MFCs. The results will be disseminated in this data base providing the heat capacity, thermal conductivity, viscosity, and the virial coefficients for the virial equation of state providing the pressure-density-temperature relation for the process gases.

Access & Use Information

Public: This dataset is intended for public access and use. License: See this page for license information.

Downloads & Resources

References

https://dx.doi.org/10.1063/1.555580
https://dx.doi.org/10.1063/1.555967
https://dx.doi.org/10.1021/ie50497a037

Dates

Metadata Created Date March 11, 2021
Metadata Updated Date July 9, 2025

Metadata Source

Harvested from NIST

Additional Metadata

Resource Type Dataset
Metadata Created Date March 11, 2021
Metadata Updated Date July 9, 2025
Publisher National Institute of Standards and Technology
Maintainer
Identifier FDB5909746795200E043065706813E54129
Language en
Data Last Modified 2023-01-11 00:00:00
Category Electronics:Semiconductors, Chemistry:Thermochemical properties
Public Access Level public
Bureau Code 006:55
Metadata Context https://project-open-data.cio.gov/v1.1/schema/data.json
Schema Version https://project-open-data.cio.gov/v1.1/schema
Catalog Describedby https://project-open-data.cio.gov/v1.1/schema/catalog.json
Harvest Object Id 3f4216dd-4b08-49bf-941b-8cf22fe6a45b
Harvest Source Id 74e175d9-66b3-4323-ac98-e2a90eeb93c0
Harvest Source Title NIST
Homepage URL https://data.nist.gov/od/id/FDB5909746795200E043065706813E54129
License https://www.nist.gov/open/license
Program Code 006:052
Related Documents https://dx.doi.org/10.1063/1.555580, https://dx.doi.org/10.1063/1.555967, https://dx.doi.org/10.1021/ie50497a037
Source Datajson Identifier True
Source Hash 1301d924d6ec22394fc34404980b4b943816313f62b2643e0c577736ff2605a5
Source Schema Version 1.1

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