Nano-Imprint Lithography: Nanonex NX-2000

Metadata Updated: March 8, 2017

Description:CORAL Name: NanoimprinterThis tool creates a pattern in a thin resist by embossing from a mold. The pattern is later transferred to the wafer by reactive ion etching.Specifications / Capabilities:Pieceparts up to 150 mm wafersNitrogen cushion pressure ensures uniformityImprint temperatures from room to 300 [HTML_REMOVED]CHeating rate [HTML_REMOVED]5 [HTML_REMOVED]C/sCooling rate [HTML_REMOVED]2 [HTML_REMOVED]C/sCapable of UV-curvable as well as thermoplastic resistsHigh throughput: capable of [HTML_REMOVED]60 s per waferFeature size down to 10 nmScientific Opportunities / Applications:Nanoscale patterningPolymer or Sol-gel nano device fabricationPolymer property study

Access & Use Information

Public: This dataset is intended for public access and use. License: No license information was provided. If this work was prepared by an officer or employee of the United States government as part of that person's official duties it is considered a U.S. Government Work.

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Dates

Metadata Created Date March 8, 2017
Metadata Updated Date March 8, 2017

Metadata Source

Harvested from Federal Laboratory Consortium Data.json

Additional Metadata

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Metadata Created Date March 8, 2017
Metadata Updated Date March 8, 2017
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Harvest Source Title Federal Laboratory Consortium Data.json
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