Compound Semiconductor Processing Facility

Metadata Updated: March 8, 2017

FUNCTION: Provides a research environment for hands-on fabrication of novel structures for fundamental investigations of new compound semiconductor materials, devices, and circuit concepts. Also, provides a service facility for electron-beam lithography, scanning electron microscopy, and fabrication of devices and circuits.DESCRIPTION: The facility mostly consists of a 2750 ft2 clean room area (Class 10,000) with HEPA filtration, temperature/humidity control, and an independent air handling system with single-pass capability. A full-time technician is assigned to the clean facility for maintaining the equipment, training new users, and assisting the hands-on users on specialized runs. State-of-the-art microwave and optoelectronic devices are processed in the clean facility using gallium arsenide, gallium nitride, and indium phosphide material systems. Lines with feature size as small as 20 nm can be fabricated with a Raith electron beam microscope, located in a separate, vibration-free area.INSTRUMENTATION: Principal capabilities include (1) standard photolithography-photoresist spinner and bake ovens, microscope, mask aligners operating in the mid-UV and deep-UV (DUV) range, and a DUV flood exposure system; (2) metallization-e-beam evaporation for standard metals; (3) dry etching-reactive ion etching (RIE), inductively coupled plasma (ICP), and plasma etching; (4) silicon nitride deposition-plasma enhanced chemical vapor deposition; (5) fine line patterning via electron-beam lithography; (6) scanning electron microscopy; and (7) other capabilities-contact alloying, profilometer, rapid thermal annealing (RTA), annealing furnaces, and gold plating.

Access & Use Information

Public: This dataset is intended for public access and use. License: No license information was provided. If this work was prepared by an officer or employee of the United States government as part of that person's official duties it is considered a U.S. Government Work.

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Dates

Metadata Created Date March 8, 2017
Metadata Updated Date March 8, 2017

Metadata Source

Harvested from Federal Laboratory Consortium Data.json

Additional Metadata

Resource Type Dataset
Metadata Created Date March 8, 2017
Metadata Updated Date March 8, 2017
Publisher Federal Laboratory Consortium
Unique Identifier 0472246D-F328-4B94-81AF-8FCE21699601
Maintainer
Maintainer Email
None
Public Access Level public
Address1 4555 Overlook Avenue S.W.
Address2
Address3
Metadata Context https://project-open-data.cio.gov/v1.1/schema/catalog.jsonld
Schema Version https://project-open-data.cio.gov/v1.1/schema
Catalog Describedby https://project-open-data.cio.gov/v1.1/schema/catalog.json
Expertise
Fax
Flcbusinessurl https://flcbusiness.federallabs.org/#/laboratory/3347
Harvest Object Id b6d25f58-4dec-4dc2-af31-6a8c26b57fc8
Harvest Source Id 5859cfed-553c-48de-a478-b67b5225f6fc
Harvest Source Title Federal Laboratory Consortium Data.json
Mission
Owneroperatorcode
Phone 202-767-3083
Postalcode 20375
Repphone (202) 404-4616
Sizesqft 0
Source Datajson Identifier True
Source Hash 2fb87214b68387651bd8a705d5c0a232c8a69ba9
Source Schema Version 1.1
Statecode DC
T2Website

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