NIST Electron Effective-Attenuation-Length Database - SRD 82
The NIST Electron Effective Attenuation Length Database provides values of electron effective attenuation lengths (EALs) in materials at user-selected electron energies between 50 eV and 2,000 eV. The database was designed mainly to provide EALs (to account for effects of elastic-electron scattering) for measurements of the thicknesses of overlayer films and, to a much lesser extent, for measurements of the depths of thin marker layers. EALs are calculated using an algorithm based on electron transport theory for measurement conditions specified by the user. A critical review on the EAL has been published [A. Jablonski and C. J. Powell, Surf. Science Reports 47, 33 (2002)], and simple practical expressions for the EAL, mean escape depth, and information depth are given in another paper by the same authors [J. Vac. Sci. Technol. A 27, 253 (2009)].
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DOI Access to NIST Electron Effective-Attenuation-Length Database - SRD 82
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Complete Metadata
| @type | dcat:Dataset |
|---|---|
| accessLevel | public |
| accrualPeriodicity | irregular |
| bureauCode |
[ "006:55" ] |
| contactPoint |
{ "fn": "Justin Gorham", "@type": "vcard:Contact", "hasEmail": "mailto:justin.gorham@nist.gov" } |
| description | The NIST Electron Effective Attenuation Length Database provides values of electron effective attenuation lengths (EALs) in materials at user-selected electron energies between 50 eV and 2,000 eV. The database was designed mainly to provide EALs (to account for effects of elastic-electron scattering) for measurements of the thicknesses of overlayer films and, to a much lesser extent, for measurements of the depths of thin marker layers. EALs are calculated using an algorithm based on electron transport theory for measurement conditions specified by the user. A critical review on the EAL has been published [A. Jablonski and C. J. Powell, Surf. Science Reports 47, 33 (2002)], and simple practical expressions for the EAL, mean escape depth, and information depth are given in another paper by the same authors [J. Vac. Sci. Technol. A 27, 253 (2009)]. |
| distribution |
[ { "title": "DOI Access to NIST Electron Effective-Attenuation-Length Database - SRD 82", "format": "text/html", "accessURL": "https://dx.doi.org/10.18434/T4MK5P", "mediaType": "text/html", "description": "DOI Access to NIST Electron Effective-Attenuation-Length Database - SRD 82" }, { "title": "Form to download the database", "accessURL": "https://www-s.nist.gov/srd_online/index.cfm?fuseaction=home.main&productID=SRD82v1.3", "description": "This database is free, but requires that a form be filled out in order to be able to download." } ] |
| identifier | ECBCC1C130092ED9E04306570681B10715 |
| keyword |
[ "Auger electron spectroscopy", "ESCA", "XPS", "depth distribution function", "effective attenuation length", "electron spectroscopy for chemical analysis", "material database", "photoelectron", "photoelectron spectroscopy", "photoemission", "surface analysis", "x-ray photoelectron spectroscopy" ] |
| landingPage | https://www.nist.gov/srd/nist-standard-reference-database-82 |
| language |
[ "en" ] |
| license | https://www.nist.gov/open/license |
| modified | 2011-01-01 00:00:00 |
| programCode |
[ "006:052" ] |
| publisher |
{ "name": "National Institute of Standards and Technology", "@type": "org:Organization" } |
| references |
[ "https://dx.doi.org/10.1116/1.3071947", "https://www.nist.gov/system/files/documents/srd/SRD82UsersGuideV1-3.pdf" ] |
| theme |
[ "Standards:Reference data" ] |
| title | NIST Electron Effective-Attenuation-Length Database - SRD 82 |
